P03100 - SEMI P31 - Practice for Catalog Publication for Chemical Amplified (CA) Photoresist Parameter StdPbc-712 It has become increasingly important

It has become increasingly important in semiconductor material and device manufacturing to describe

本規定は暫定スタンダードであり，半導体工場内の製造装置の統合を実現するための概念，挙動，およびサービスを定義するものである。本スタンダードの範囲には工場ホストシステムへのインタフェースを提供する半導体製造装置，すべてが含まれる。サービスによっては材料搬送系に適用できない場合もある。

This Standard establishes the properties and physical dimensions of mass flow controllers and mass flow meters for 1

the following tool types:

4-0704 (technical revision)

P03100 - SEMI P31 - Practice for Catalog Publication for Chemical Amplified (CA) Photoresist Parameter StdPbc-712 It has become increasingly importantThis Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 13, 2011. Available at www. semiviews. org and www. semi. org in June 2011; originally published September 1997; previously published March 2004. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not