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SEMI C20-1101 (technical revision)
Determination of water vapor barrier property of plastic films with high gas barrier used for electronics devices such as flexible displays
which is used in the semiconductor industry for the deposition of aluminium metal by vapor deposition techniques and aluminium oxide based layers by atomic layer deposition
Monthly global semiconductor equipment billings and bi-annual forecast reports
VPD-Atomic Absorption Spectroscopy (VPD-AAS)
E13200 - SEMI E132 - Specification for Equipment Client Authentication and Authorization Revision:SEMI E132-0310 - Superseded SEMI C20-1101 (technical revision)* This Standard has the option to purchase the Current document with a redline document (Current + Redline). The redline document is included with the Current document as a comparison tool to help identify changes that have been made between the Current version and the previous version (Superseded). If differences should exist between the redline document and the Current document, the Current version is the official and authoritative version. 1
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